Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
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IBM Systems and Technology Group<br />
Analysis <str<strong>on</strong>g>of</str<strong>on</strong>g> <strong>CD</strong> Variati<strong>on</strong><br />
-<br />
-<br />
Raw Data<br />
Standardize<br />
Intrafield (ACLV)<br />
c<strong>on</strong>tributi<strong>on</strong>s<br />
Interfield (AWLV)<br />
c<strong>on</strong>tributi<strong>on</strong>s<br />
Scan directi<strong>on</strong><br />
<str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> time<br />
Residual<br />
Illustrati<strong>on</strong>: Resist A / Topcoat TC1, 250 mm/s<br />
zWET WET = f(wett<strong>in</strong>g time)? time)<br />
Total Wet <str<strong>on</strong>g>Time</str<strong>on</strong>g> Variati<strong>on</strong> Signature<br />
17 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
© 2003 IBM Corporati<strong>on</strong>
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