Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
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IBM Systems and Technology Group<br />
Analysis <str<strong>on</strong>g>of</str<strong>on</strong>g> <strong>CD</strong> Variati<strong>on</strong><br />
-<br />
Raw Data<br />
Standardize<br />
Intrafield (ACLV)<br />
c<strong>on</strong>tributi<strong>on</strong>s<br />
-<br />
250<br />
Interfield (AWLV)<br />
σ =0.7316<br />
z<br />
σ 200 z = 0.732<br />
c<strong>on</strong>tributi<strong>on</strong>s<br />
Scan directi<strong>on</strong><br />
<str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> time<br />
Residual<br />
Illustrati<strong>on</strong>: Resist A / Topcoat TC1, 250 mm/s<br />
σ z<br />
B<strong>in</strong><br />
150<br />
100<br />
50<br />
1.2<br />
1<br />
0.8<br />
0.6<br />
0.4<br />
0.2<br />
0<br />
Intrafield (ACLV) C<strong>on</strong>tributi<strong>on</strong> Removed<br />
0<br />
-2.5 -2 -1.5 -1 -0.5 0 0.5 1 1.5 2 2.5<br />
Standardized Variati<strong>on</strong> <strong>in</strong> Top <strong>CD</strong> (nm)<br />
14 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
1.00<br />
0.69<br />
Top <strong>CD</strong><br />
Total ACLV Scan <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> Residual<br />
© 2003 IBM Corporati<strong>on</strong>
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