Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
Effect of Wetting Time on CD Uniformity in Immersion Lithography
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
IBM Systems and Technology Group<br />
C<strong>on</strong>tributi<strong>on</strong>s to <strong>CD</strong> Variati<strong>on</strong><br />
� Intrafield (ACLV)<br />
– Photomask <strong>CD</strong> error<br />
– Feature orientati<strong>on</strong> relative to scan directi<strong>on</strong><br />
– Intensity variati<strong>on</strong> across slit<br />
� Interfield (AWLV)<br />
– Scann<strong>in</strong>g directi<strong>on</strong><br />
– Process (hotplate, develop process, wett<strong>in</strong>g)<br />
� Residuals<br />
Reference: A. W<strong>on</strong>g, A. Molless, T. Brunner et al.,”L<strong>in</strong>ewidth variati<strong>on</strong> characterizati<strong>on</strong> by spatial<br />
decompositi<strong>on</strong>”, JMMM, 1 pp. 106-115(2002).<br />
11 <str<strong>on</strong>g>Effect</str<strong>on</strong>g> <str<strong>on</strong>g>of</str<strong>on</strong>g> <str<strong>on</strong>g>Wett<strong>in</strong>g</str<strong>on</strong>g> <str<strong>on</strong>g>Time</str<strong>on</strong>g> <strong>on</strong> <strong>CD</strong>U - Kaushal Patel September 13, 2005<br />
© 2003 IBM Corporati<strong>on</strong>