Publikationsliste Prof. Dr. Ulrich Mescheder Buchbeiträge: [1] U ...
Publikationsliste Prof. Dr. Ulrich Mescheder Buchbeiträge: [1] U ...
Publikationsliste Prof. Dr. Ulrich Mescheder Buchbeiträge: [1] U ...
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<strong>Publikationsliste</strong> <strong>Prof</strong>. <strong>Dr</strong>. <strong>Ulrich</strong> <strong>Mescheder</strong><br />
<strong>Buchbeiträge</strong>:<br />
[1] U. <strong>Mescheder</strong> Porous Silicon: Technology and Application. In: Series NATO Science Series II:<br />
Mathematics, Physics and Chemistry, Vol. 181: Yurish, Sergey Y.; Gomes, Maria Teresa S.R.<br />
(Eds.): 2004, S. 273-288, ISBN: 1-4020-2929-2<br />
[2] U. <strong>Mescheder</strong> Modern silicon based MEMS-technology. In: Series NATO Science Series II:<br />
Mathematics, Physics and Chemistry, Vol. 181: Yurish, Sergey Y.; Gomes, Maria Teresa S. R.<br />
(Eds.): 2004, S. 255-272, ISBN 1-4020-2929-2<br />
Bücher:<br />
[3] U. <strong>Mescheder</strong>, Mikrosystemtechnik: Konzepte und Anwendungen. Stuttgart: Teubner-Verlag, 2.<br />
überarbeitete und ergänzte Auflage, 2004, 292 S., ISBN 3-519-16256-3<br />
[4] U. <strong>Mescheder</strong>; Mikrosystemtechnik: Konzepte und Anwendungen. Stuttgart: B. G. Teubner, 1.<br />
Auflage, 2000, S. 323, ISBN 3-519-06256-9<br />
Veröffentlichungen in Zeitschriften und Konferenzberichten:<br />
[5] A. Nimo, U. <strong>Mescheder</strong>, B. Müller, A. S. Abou Elkeir: 3D capacitive vibrational micro harvester<br />
using isotropic charging of electrets deposited on vertical sidewalls, Proc. SPIE 8066, Prague April<br />
2011<br />
[6] P. Jonnalagadda, U. <strong>Mescheder</strong>, A. Kovacs, A. Nimo: Nanoneedles Based on Porous Silicon for<br />
Chip Bonding with Self Assembly Capability, physica status solidi (a) Article first published online:<br />
7 APR 2011, DOI: 10.1002/pssc.201000139<br />
[7] A. Ivanov, U. <strong>Mescheder</strong>, A. Kovacs: High quality 3D shapes by silicon anodization, physica status<br />
solidi (a), Article first published online: 18 MAR 2011,DOI: 10.1002/pssa.201000163<br />
[8] A. Saad, U. <strong>Mescheder</strong>, B. Müller, A. Nimo: High Eficient, Low Cost Electret Charging Set-Up for<br />
MEMS Based Energy Harvesting System, Proc. PowerMEMS 2010, Leuven, Belgium, November<br />
30 – December 3, 2010<br />
[9] A. Nimo, U. <strong>Mescheder</strong>: 3-D Capacitive Vibrational Harvester for Autonomous Low Power<br />
Sensors, Proc. PowerMEMS 2010, Leuven, Belgium, November 30 – December 3, 2010<br />
[10] S. Ressel, M. Gohlke, D. Rauen, T. Schuldt, W. Kronast, U. <strong>Mescheder</strong>, U. Johann, D. Weise, C.<br />
Braxmaier: Ultra-stable assembly and integration technology for ground- and space-based optical<br />
systems, J. Appl Optics, Applied Optics, Vol. 49, Issue 22, pp. 4296-4303 (2010)<br />
[11] T. Bruns, L. Becsi, M. Talkenberg, M. Wagner, P. Weber, U. <strong>Mescheder</strong>, H. Schneckenburger:<br />
Microfluidic system for single cell sorting with optical tweezers, Session: Single Cells and<br />
Molecules "Microfluidic system for single cell sorting with optical tweezers", LALS'2010 - 12th<br />
International Conference on Laser Applications in Life Sciences '2010; Oulu, Finnland 9.-<br />
11.06.2010.<br />
[12] A. Kovacs, P. Jonnalagadda, X. Meng, U. <strong>Mescheder</strong>: Optisches Messsystem für biosensorische<br />
Anwendungen, Proceedings 15.ITG-/GMM-Fachtagung Sensoren und Messsysteme, Nürnberg,<br />
2010, 182-188<br />
[13] A. Ivanov, A. Kovacs, U. <strong>Mescheder</strong>: Nasschemisches Ätzen von nahezu beliebigen 3D-Strukturen<br />
in Silizium. Wet chemical etching of nearly arbitrary 3D-structures in silicon. Proceedings Workshop<br />
Nano-Mikro-Integration, Erfurt, 3.-4.3.2010 , 65-68
[14] P. Jonnalagadda, U. <strong>Mescheder</strong>, A. Kovacs, A. Nimo: Bondverfahren für Selbstjustierung und<br />
Mehrfachbonden basierend auf nasschemisch präparierten Si-Oberflächen, Proceedings<br />
Workshop Nano-Mikro-Integration, Erfurt, 3.-4.3.2010, 41-44<br />
[15] U.M. <strong>Mescheder</strong>, P. Jonnalagadda, A. Kovacs, X. Meng: Optischer Biosensor mittels<br />
selbstorganisierter nanostrukturierte Multilayerschichten/ Optical biosensor using selforganized<br />
nanostructured multilayers, Proceedings Workshop Nano-Mikro-Integration, Erfurt, 3.-4.3.2010,<br />
105-110<br />
[16] P. Jonnalagadda, U. <strong>Mescheder</strong>, A. Kovacs and A. Nimo: Nanoneedles based on porous silicon for<br />
chip bonding with self-Assembly capability, paper abstract, 7th International Conference on porous<br />
materials and technologies, Valencia (Spain), 14th-19th of March 2010<br />
[17] A. Ivanov, A. Kovacs, U. <strong>Mescheder</strong>: High quality 3d shapes by silicon anodization, paper abstract,<br />
7th International Conference on porous materials and technologies, Valencia (Spain), 14th-19th of<br />
March 2010<br />
[18] W. Kronast, U. <strong>Mescheder</strong>, B. Müller, A. Nimo, C. Braxmaier, T. Schuldt: Development of a tilt<br />
actuated micromirror for applications in laser interferometry. Proceedings of SPIE, Photonics West<br />
2010-MOEMS-MEMS: Micro- and Nanofabrication, San Francisco, Ca, USA, 23-28 January 2010,<br />
Vol.7594-25, doi:10.1117/12.839577, 10 pages<br />
[19] H. Schneckenburger, R. Börret, C. Braxmaier, R. Kessler, P. Kioschis, D. Kühlke, U. <strong>Mescheder</strong>,<br />
W. Schröder, Ch. Nachtigall: Dem Energiestoffwechsel von Tumorzellen und Bioreagenzien auf<br />
der Spur, BioPhotonik 2009, No.1-2009, pp.26-28<br />
[20] U. <strong>Mescheder</strong>, A. Kovacs, J. Kritwattanakhorn, B. Müller, M.-L. Bauersfeld, S. Rademacher, J.<br />
Wöllenstein, Ch. Ament, A. Peter: Mikrostrukturierter Sensorarray zur Luftqualitätsmessung<br />
(Mosel) Dokumentation zum Forschungstag 2009, Hochtechnologieforschung, S. 169<br />
(Posterabstract)<br />
[21] U <strong>Mescheder</strong>, B.Müller, S Baborie, and P Urbanovic: Properties of SiO2 electret films charged by<br />
ion implantation for MEMS-based energy harvesting systems, Journal of Micromechanics and<br />
Microengineering, Vol. 19, No. 9 (2009), 094003 (6pp)<br />
[22] A. Kovacs, P. Jonnalagadda, X. Y. Meng and U. <strong>Mescheder</strong>: Characterization of Porous Based<br />
Optical Sensor System for Biosensor Applications, proceedings of the 8th IEEE Conference on<br />
Sensors, Christchurch, New Zealand, 25-28 October, 2009, pp. 21- 26<br />
[23] U.M.<strong>Mescheder</strong>, A. Kovacs, P. Jonnalagadda, A. Nimo: Nanostrukturierte Siliziumoberflächen für<br />
Mikro-Nano-Integration, Tagungsband Mikrosystemtechnik Kongress 2009, Oktober 2009, Seite<br />
210-213<br />
[24] A. Ivanov, A. Kovacs, U. <strong>Mescheder</strong>, S. Kuhn, A. Burr: Optimisation of surface quality of 3D silicon<br />
master forms for injection molding of optical micro elements, Tagungsband Mikrosystemtechnik<br />
Kongress 2009, Oktober 2009, Seite 726-729<br />
[25] W. Kronast, U. <strong>Mescheder</strong>, R. Huster: Huster Stressuntersuchung und Optimierung von SOI<br />
basierten Membranen, Tagungsband Mikrosystemtechnik Kongress 2009, Oktober 2009, S. 590-<br />
593<br />
[26] A. Kovacs, P. Jonnalagadda, X. Meng, U. <strong>Mescheder</strong>: Entwicklung und Charakterisierung von<br />
photonischen Multischichten aus porösem Silizium für biosensorische Anwendungen, Tagungsband<br />
Mikrosystemtechnik Kongress 2009, Oktober 2009, Seite 333-336<br />
[27] A. Kovacs, D. Meister, U. <strong>Mescheder</strong>: Investigation of humidity adsorption in porous silicon layers,<br />
Phys. Status Solidi A 206, No. 6, 1343–1347 (2009)<br />
[28] U. <strong>Mescheder</strong>, A. Kovacs, P. Jonnalagadda: Si-based Self-organized Nanostructuring Processes<br />
for MEMS Applications, Technical Programme and Abstract Book of the 2nd Intern. Conference on<br />
Frontiers in Nanoscience and Technology, Cochin, India, January 3-6, 2009, p. 37<br />
[29] Adam Kovacs, Andras Kovacs, U. <strong>Mescheder</strong>: Estimation of elasticity modulus and fracture<br />
strength of thin perforated SiN membranes with finite element simulations. Computational Material<br />
Science (2008). ISSN 0927-0256 43 p. 59-64<br />
[30] J. Wöllenstein, M.-L. Bauersfeld, S. Rademacher, A. Kovacs, J. Kritwattanakhorn, B. Müller, U.<br />
<strong>Mescheder</strong>, A. Peter: Sensorarray zur Luftqualitätsmessung, VDI-Kongress Sensoren und<br />
Messsysteme 2008, VDI-Berichte Nr. 2011, S. 425-433
[31] Hellmuth, T.; Khrennikov, K.; Kronast, W.; Huster, R.; <strong>Mescheder</strong>, U.: Optimisation and<br />
characterisation of parabolic membrane mirrors. MEMS, MOEMS, and Micromachining III. Edited<br />
by Urey, Hakan. Proceedings of the SPIE, Volume 6993, pp. 699305-699305-11 (2008), DOI:<br />
10.1117/12.780758<br />
[32] U. <strong>Mescheder</strong>, P. Urbanovic, B. Müller, S. Baborie: Charging of SiO2 electret film by ion<br />
implantation for MEMS based energy harvesting systems. Proceedings PowerMEMS 2008,<br />
Sendai, Japan, November 9-12, 2008, p 501-504<br />
[33] A. Kovacs, D. Meister, U. <strong>Mescheder</strong>: Investigation of humidity adsorption in porous silicon layers,<br />
Porous Semiconductors – Science and Technology 2008, Sa Coma-Mallorca, Spain, 10-14 March,<br />
2008, Materials of the 6th International conference, pp 403-404<br />
[34] A. Ivanov, U. <strong>Mescheder</strong>, M. Kröner, P. Woias: Formation of arbitrarily shaped 3D-forms in silicon<br />
by electrochemical wet-etching, 19th MicroMechanics Europe Workshop, 28-30. September, 2008,<br />
Aachen, Deutschland, Proceedings, ISBN 978-3-00-025529-8, S.315-318<br />
[35] Andras Kovacs, Adam Kovacs, M. Pogany, U. <strong>Mescheder</strong>: Mechanical investigation of perforated<br />
and porous membranes for micro- and nanofilter application, Sensors & Actuators B, Chemical,<br />
Volume 127, Issue 1, 20 October 2007, Pages 120-125<br />
[36] J. Kritwattanakhorn, M., L. Bauersfeld, A. Kovacs, U. <strong>Mescheder</strong>, B. Müller, S. Rademacher, J.<br />
Wöllenstein: Optimization of Platinum adhesion in electrochemical etching process for multi-sensor<br />
systems, Sensors & Actuators B, Chemical, Volume 127, Issue 1, 20 October 2007, Pages 126-<br />
131<br />
[37] Adam Kovacs, Andras Kovacs, <strong>Ulrich</strong> <strong>Mescheder</strong>: Effektive material properties of multilayered<br />
porous nanofilters, 17th International Workshop on Computational Mechanics of Materials, August<br />
22-24, 2007, Paris, Book of Abstracts pp.29-30.<br />
[38] U. <strong>Mescheder</strong>, R. Huster, W. Kronast:, T. Hellmuth, K. Khrennikov: Optimierung und<br />
Charakterisierung eines Membranspiegels zur dynamischen Fokussierung, Mikrosystemtechnik-<br />
Kongress 2007, 15-17. Oktober, <strong>Dr</strong>esden, 2007, Tagungsband, S.1011-1014<br />
[39] A. Ivanov, U. <strong>Mescheder</strong>, A. Kovacs, R. Huster: Einfluss unterschiedlicher Passivierungsschichten<br />
auf die Bildungsrate von porösem Silizium an Strukturkanten bei der 3D-Formherstellung,<br />
Mikrosystemtechnik-Kongress 2007, 15-17. Oktober, <strong>Dr</strong>esden, 2007, Tagungsband, S.529-532<br />
[40] Peter, Ch. Ament, M.-L. Bauersfeld, S. Rademacher, J. Wöllenstein, J. Kritwattanakhorn, A.<br />
Kovacs, B. Müller, U. <strong>Mescheder</strong>: Modelbasierte Verfahren zur Bestimmung der Luftgüte,<br />
Mikrosystemtechnik-Kongress 2007, 15-17. Oktober, <strong>Dr</strong>esden, 2007, Tagungsband, S.1079-1082<br />
[41] U. <strong>Mescheder</strong>, J. Kritwattanakhorn, A. Kovacs, B. Müller, Ch. Ament, A. Peter, M.-L. Bauersfeld, S.<br />
Rademacher, J. Wöllenstein: Sensorarray zur Luftqualitätsmessung, Horizonte, Nr.30, Juni, 2007,<br />
S.3-8.<br />
[42] U. <strong>Mescheder</strong>, M.-L. Bauersfeld, A. Kovacs, J. Kritwattanakhorn, B. Müller, A. Peter, Ch. Ament, S.<br />
Rademacher, J. Wöllenstein: MEMS-Based Air Quality Sensor, Technical Digest, Transducers XIV<br />
& Eurosensors XXI, June 10-14, Lyon, Frankreich, 2007, S.1417-1420.<br />
[43] <strong>Mescheder</strong>, U.: Aktive Optik sowie Luftqualitätssensoren. Carl Hanser Verlag, Mikroproduktion, 2<br />
(2007), S.61<br />
[44] Kovacs, Zs. Vizvary, A. Kovacs, U. <strong>Mescheder</strong>: Large deflection analysis of perforated silicon<br />
nitride membranes; 6th EMSC, Budapest Hungary, Proc. CD S12, K140, 28.08.-01.09.2006<br />
[45] U. <strong>Mescheder</strong>, Z. Torok, W. Kronast "Active focusing device based on MOEMS technology ",<br />
Proceedings of SPIE Vol.8186-1, Strasbourg 3.-7.April 2006<br />
[46] Andras Kovacs, M. Pogany, U. <strong>Mescheder</strong>, Adam Kovacs: Realization and mechanical<br />
investigation of perforated and porous membranes for filter applications: XX Eurosen-sors,<br />
Göteborg, Schweden, 17.-20. September 2006,Proc., ISBN 91-631-9280-2, Vol. II, p. 392-393<br />
[47] J. Kritwattanakhorn, A. Kovacs, U. <strong>Mescheder</strong>, B. Müller, M.-L. Bauersfeld, S. Rademacher, J.<br />
Wöllenstein: Optimization of Platinum Adhesion in Electroechemical Etching Processes for Multisensor<br />
Systems: XX Eurosensors, Göteborg, Schweden, 17.-20. September 2006, Proc., ISBN 91-<br />
631-9280-2, Vol. II, p. 376-377
[48] U. <strong>Mescheder</strong>, M. Freudenreich, S.Somogyi, C. Estan: Distortion Optimized Focusing Mirror<br />
Device with Large Aperture. Journal: SENSORS AND ACTUATORS A: PHYSICAL Vol. 130-131,<br />
2006, p. 20-27<br />
[49] U. <strong>Mescheder</strong>, Zoltan Torok, W. Kronast: Active focusing device based on MOEMS technology.<br />
Proceedings of SPIE Vol.8186, 2006, p 1-12<br />
[50] R. Huster, A. Kovacs, U. <strong>Mescheder</strong>: 3-D Micro Free-Form Manufacturing in Silicon Micro-Free-<br />
Form Production for Plastics Moulding Technology, Proceedings Micro System Technology<br />
2005,ed. H.Reichl, Munich, 2005, pp 55<br />
[51] Ch. Ament, M.-L. Bauersfeld, A. Kovacs, J. Kritwattanakhorn, U. <strong>Mescheder</strong>, B. Müller, A. Peter, J.<br />
Radebacher, J. Wöllenstein: Sensorarray zur Luftqualitätsmessung, Tagungsband des<br />
Mikrosystemtechnik-Kongresses 2005, Freiburg, 10.-12.10.2005, S.619-623<br />
[52] U. <strong>Mescheder</strong>, A. Kovacs, R. Schneider: Optische Penmaus mit Bluetooth: Horizonte 27,<br />
Mannheim, Dez. 2005: S. 8-11<br />
[53] Peter, Ch. Ament, M.-L. Bauersfeld, S. Rademacher, R. Stich, J. Wöllenstein, A. Kovács, J.<br />
Kritwattanakhorn, B. Müller und U. <strong>Mescheder</strong>: Neuartiger Mikrosensor zur Luftgütemessung mit<br />
kombiniertem Feuchte- und Gassensor. Tagungsband des 50. Internationales Wissenschaftliches<br />
Kolloquium, Technische Universität Ilmenau, 19.-23. September 2005, S. 273-274<br />
[54] U. <strong>Mescheder</strong>, A. Kovacs: 3D-Mikrostrukturierungsverfahren: MikroSystemTechnik 3/2005, 7-9,<br />
GIT Verlag, 2005: S.10-12<br />
[55] U. <strong>Mescheder</strong>, M. Freudenreich, S.Somogyi, C. Estan: MOEMS Focusing Device with Ideal<br />
Parabolic Deflection Shape, Solid-State Sensors, Actuators and Microsystems, 2005, Digest of<br />
Technical Papers. TRANSDUCERS '05. The 13th International Conference on Volume 1, June 5-<br />
9, 2005 Page(s):1000 – 1005<br />
[56] U. <strong>Mescheder</strong>: Modern silicon based MEMS-technology, Series: NATO Science Series II:<br />
Mathematics, Physics and Chemistry, Vol. 181 , Yurish, Sergey Y.; Gomes, Maria Teresa S.R.<br />
(Eds.) 2004, ISBN: 1-4020-2929-2, S. 255-272<br />
[57] U. <strong>Mescheder</strong>: Porous Silicon: Technology and Application, Series: NATO Science Series II:<br />
Mathematics, Physics and Chemistry, Vol. 181 , Yurish, Sergey Y.; Gomes, Maria Teresa S.R.<br />
(Eds.) 2004, ISBN: 1-4020-2929-2, S. 273-288<br />
[58] W. Kronast, A.J. Laskurain, U. <strong>Mescheder</strong>: Das Rasterkraftmikroskop (AFM) zur Charakterisierung<br />
und Strukturierung im Nanometerbereich, Horizonte Heft 25, Dezember 2004, S.3-8<br />
[59] M.Herding, G.Somogyi, U. <strong>Mescheder</strong>, P.Woias: A new micromachined optical fiber switch for<br />
instrumentation purposes, Proceedings of Photonics Europe 2004, Strasbourg, France, 2004, pp.<br />
264-273<br />
[60] M. Freudenreich, U. M. <strong>Mescheder</strong>, G. Somogyi: Simulation and realization of a novel<br />
micromechanical bi-stable switch, Sensors and Actuators A: Physical, Vol 114/2-3 pp 451-459,<br />
2004<br />
[61] U. <strong>Mescheder</strong>, W. Kronast and N. Naychuk: Reliability investigations in micromechanical devices,<br />
Sensors and Actuators A: Physical, Volume 110, Issues 1-3, Pages 150-156 (1 February 2004)<br />
[62] U. <strong>Mescheder</strong>: Nanoporous Silicon, Multifunctional material for Microsystems, Proceedings of<br />
AVT-099 Novel Vehicle Concepts and Emerging Vehicle Technology, Brüssel, April 2003<br />
[63] U.M. <strong>Mescheder</strong>, W. Kronast, N. Naychuk: Reliability Investigations in micromechanical Devices,<br />
CD-ROM Proceedings of EurosensorsXVI, September 2002, Prague, Czech Republic, MP58, pp<br />
280-281<br />
[64] P. Fürjes, A. Kovács, Cs. Dücső, M. Ádám, B. Müller and U. <strong>Mescheder</strong>: Porous Silicon Based<br />
Humidity Sensor with Interdigital Electrodes and Internal Heaters, Proceedings Eurosensors XVI,<br />
Prague Sept. 2002, 605-606<br />
[65] U. <strong>Mescheder</strong> et al.: Local Laser Bonding for Low Temperature Budget, Sensors and Actuators<br />
A97-98 (2002) 422-427<br />
[66] U. <strong>Mescheder</strong> et al.: 3D Structuring of c-Si using porous Silicon, proceedings 2nd IEEE conference<br />
on Nanotechnology, 33-36 (2002)
[67] U.M. <strong>Mescheder</strong>, A. Kovacs, W. Kronast, I. Bársony, M. Ádám and Cs. Dücsö: Porous silicon as<br />
multifunctional material in MEMS, Proceedings of IEEE-Nanotechnology, Maui (USA), 2001, pp.<br />
483-488<br />
[68] U. <strong>Mescheder</strong>, M. Alavi; K. Hiltmann; Ch. Lizeau, Ch. Nachtigall and H. Sandmaier: Local Laser<br />
Bonding for Low Temperature Budget, Digest of Technical Papers of the Transducers ´01,<br />
Eurosensors XV, pp. 620-623, Munich, Germany, June 2001<br />
[69] U. <strong>Mescheder</strong>, A. Kovacs: Surface Micromachining Process for C-Si as Active Material, Digest of<br />
Technical Papers of the Transducers ´01, Eurosensors XV, pp. 218-221, Munich, Germany, June<br />
2001<br />
[70] U. <strong>Mescheder</strong>, A. Kovacs: Porous silicon as sacrifical layer for sub-µm-crystalline freestanding<br />
structures, invited paper presented on the conference "Sensor 2000, Nexus-Session", Juni 2000<br />
St. Petersburg (Russia)<br />
[71] M. Reichardt, U. <strong>Mescheder</strong>, N. Nosseir: Simulation of a Micro-Fabricated Inclinometer,<br />
Proceedings of the International Conference on Mathematics and Engineering Techniques in<br />
Medicine abd Biological Sciences (METMBS'00), Vol. I, pp. 309-314, Las Vegas, Nevada, USA,<br />
June 26-29, 2000<br />
[72] U. M. <strong>Mescheder</strong>, Ch. Kötter: Optical monitoring and control of Si wet etching", Sensors and<br />
Actuators 76 (1-3), 425-430 (1999)<br />
[73] U. <strong>Mescheder</strong>, Ch. Kötter: Optical monitoring and control of Si wet etching, Proceedings der<br />
Eurosensors XII, Internat. Konferenz, Southampton, 1998, p. 51-54<br />
[74] U. <strong>Mescheder</strong>, Ch. Kötter, B. Katzenstein, T. Lang: Piezoelectric inch worm motor with<br />
monolithically integrated driving block, Proceedings Actuators 98, Internationale Konferenz ,<br />
Bremen Juni 1998, p. 327-331<br />
[75] U. <strong>Mescheder</strong>, Ch. Kötter, E Kolguin, A. Oukhov: Optische Insitu-Prozeßkontrolle beim<br />
anisotropen Ätzen von Si-Membranen. in Sensoren und Meßsysteme, VDI-Verlag, 1998, p. 365–<br />
372<br />
[76] U. <strong>Mescheder</strong>, S. Majer: Mikromechanischer Zwei-Achsen-Neigungssensor, Tagungsband zum<br />
3.Forschungstag, Forschungstag der baden-württembergischen Fachhochschulen , Karlsruhe<br />
1997, S. 48-49<br />
[77] U. <strong>Mescheder</strong>, Ch. Kötter: Laserschreibsystem mit Piezotisch, Tagungsband zum 3.<br />
Forschungstag der baden-württembergischen Fachhochschulen , Karlsruhe 1997, S. 51<br />
[78] U. <strong>Mescheder</strong>, B. Richards, S. Majer, N. Aribas, U. Lohmann: Expertensystem für den Entwurf von<br />
Mikrosystemen, Tagungsband zum 3.Forschungstag, Forschungstag der badenwürttembergischen<br />
Fachhochschulen , Karlsruhe 1997, S. 50<br />
[79] E.A. Kolgin, I.A. Tumanov, A.A. Ukhov, U. <strong>Mescheder</strong>: Photometric device for control of<br />
micromechanical elements manufacturing, Proceedings of third international scientific technical<br />
Conference of Actual Problems of electronic instrument engineering, APEIE-96, Vol. 2, p.75-76<br />
[80] U. <strong>Mescheder</strong>, S. Majer: Micromechanical Inclinometer, Sensors&Actuators, A60 (1997) 134-138<br />
[81] U. <strong>Mescheder</strong>, S. Majer: Mikromechanischer Neigungssensor für industrielle Anwendungen, im<br />
Tagungsband des 41.Internationalem Wissenschaftlichen Kolloquium der TU Ilmenau, Sept. 1996,<br />
p. 507-514<br />
[82] U. <strong>Mescheder</strong>, S. Majer, R. Keller: 2-Achsen Si-Neigungssensor: Simulation und Realisierung,<br />
VDI-Berichte1255, VDI-Verlag Düsseldorf, 1996, p. 83-93<br />
[83] S. Majer, U. <strong>Mescheder</strong>: Simulation supported design of micromechanical sensors, Beitrag in:<br />
Simulation and Design of Microsystems and Microstructures, Computational Mechanics<br />
Publication, Southampton/Boston, 1995 (ed. R.A. Adey, A. Lahrmann, C. Leßmöllmann) p. 329-<br />
337<br />
[84] M. Zander und U. <strong>Mescheder</strong>: Maskenmetrologie: Anforderungen und Trends, VDI-Berichte 935,<br />
Tagungsbericht "Maskentechnik für Mikroelektronik-Bausteine" (1991), p. 7-40<br />
[85] L. Buchmann, U. <strong>Mescheder</strong>, H. Torkler: Characterisation of Silicon open Stencil Masks in an Ion<br />
Projection Lithography Machine, Micro. Eng. 10 (1991), pp. 353
[86] U. <strong>Mescheder</strong>, U. Mackens, H. Lifka, R. Dammel, G. Pawlowski, J. Theis: Application of Positive<br />
and Negative Tone X-Ray Resist for 0.5 µm CMOS Device Fabrication, Microc. Eng. 9 (1990), pp.<br />
481<br />
[87] H. Schaffer, U. <strong>Mescheder</strong>, U. Weigmann, H. C. Petzold: Influence of X-Ray Mask Repair on<br />
Pattern Placement Accuracy, Microc. Eng. 9 (1990), pp. 251<br />
[88] H. Lüthje, A. Bruns, M. Harms, I. Köhler, U. <strong>Mescheder</strong>, U. Mackens, T. Stuck: X-Ray Mask<br />
Technology: Precise Etching of Sub-half-micron Tungsten Absorber Features, Microc. Eng. 9<br />
(1990), pp. 255<br />
[89] U. <strong>Mescheder</strong>, K. Werner: Submikrometer Linienbreitenmetrologie hoher Genauigkeit, VDI-Bericht<br />
795 "Maskentechnik für Mikroelektronik Bausteine" (1989), pp. 155<br />
[90] U. Mackens, U. <strong>Mescheder</strong>, H. Lüthje: Herstellung einer 0.5 µm Schaltung und<br />
Overlayuntersuchungen, GME-Fachbericht Mikroelektronik (1989)<br />
[91] U. <strong>Mescheder</strong>, U. Mackens, F. Mund: Investigation of Linewidth Uniformity in X-Ray Lithography,<br />
SPIE Vol. 1087 (1989), pp. 396<br />
[92] U. Mackens, U. <strong>Mescheder</strong>, F. Mund, H. Lüthje, H. Lifka, C. A. H. Juffermans, P.H. Woerlee, A.J.<br />
Walker: Fabrication of 0.5 µm NMOS-Devices by all level X-ray-Lithography, Microc. Eng. 8<br />
(1989), pp. 89<br />
[93] U. Mackens, H. Lüthje, U. <strong>Mescheder</strong>, F. Mund, S. Pongratz: Application of SiC-X-Ray Masks for<br />
Fabricating Sub-micron Devices, SPIE Vol. 923 (1988), pp. 9<br />
[94] S. Pongratz, U. <strong>Mescheder</strong>, C. Ehrlich, H.-L. Huber, K. Kohlmann: State of the Art of Pattern<br />
Placement Accuracy of Silicon X-Ray Master Masks, Microc. Eng. 8 (1989), pp.117<br />
[95] H. L. Huber, U. <strong>Mescheder</strong>, F. Mund, S. Pongratz, J. Trube, W. Windbracke: Sub-half-micron<br />
Critical Dimension Control in X-Ray Mask Technology, Journ. Vac. Sc. B6(6) (1988), pp. 2184<br />
[96] U. <strong>Mescheder</strong>, F. Mund, H. L. Huber: Linewidth Metrology for X-Ray Masks with Subhalfmicron<br />
Feature Size, Microcircuit Eng. 7 (1988), pp. 653<br />
[97] U. <strong>Mescheder</strong>, W. Windbracke, H. L. Huber: Kontrolle der Lagegenauigkeit von Absorberstrukturen<br />
bei Röntgenmasken, Jahrestagung der Deutschen Gesellschaft für Angewandte Optik,<br />
Berchtesgarden 1987<br />
[98] H. Betz, H. L. Huber, S. Pongratz, W. Rohrmoser, W. Windbracke, U. <strong>Mescheder</strong>: Silicon X-Ray<br />
Masks Pattern Placement and Overlay Accuracy, Microcircuit Eng. 6 (1987), pp.41<br />
[99] H. Lüthje, U. Mackens, U. <strong>Mescheder</strong>, B. Matthießen: Stability of SiC-Masks for High Resolution<br />
Synchrotron X-ray Lithography, Microelectronic Proc. 6 (1987), p.39<br />
[100] U. <strong>Mescheder</strong> and G. Weiser: Optical study of charge injection in plasma deposited a-Si:H, Journ.<br />
of Non-Crystalline Solids 77&78 (1985) pp. 571