continued from part 1 - Controller General of Patents, Designs, and ...

(12) PATENT APPLICATION PUBLICATION (21) Application No.6551/DELNP/2008 A
(19) INDIA
(22) Date of filing of Application :28/07/2008 (43) Publication Date : 24/10/2008
(54) Title of the invention : "LIQUID MATERIAL SUPPLYING APPARATUS AND LIQUID MATERIAL SUPPLYING
METHOD"
(51) International classification :B05C 11/10 (71)Name of Applicant :
(31) Priority Document No :2006-016256 1)ORIGIN ELECTRIC COMPANY, LIMITED
(32) Priority Date :25/01/2006
Address of Applicant :18-1, TAKADA 1-CHOME,
(33) Name of priority country :Japan
TOSHIMA-KU, TOKYO 1718555, JAPAN. Japan
(86) International Application No :PCT/JP2007/051163 (72)Name of Inventor :
Filing Date
:25/01/2007
1)HIRONOBU NISHIMURA
(87) International Publication No :WO 2007/086459 2)MASAHIRO NAKAMURA
(61) Patent of Addition to Application
Number
Filing Date
:NA
:NA
(62) Divisional to Application Number :NA
Filing Date
:NA
(57) Abstract :
In order to apply a liquid material including a small number of bubbles, in particular almost no bubbles larger than a predetermined
size, a liquid material supplying apparatus includes: a pressure tank applying a positive pressure higher than the atmospheric pressure
to the liquid material; a syringe having a nozzle for discharging the liquid material; and a liquid path member forming a liquid path
leading the liquid material from the pressure tank to the syringe; a valve member which is provided on the liquid path member and
which opens/closes the liquid path; a bubble defoaming filter which is provided on the liquid path member between the syringe and
the valve member and which removes bubbles from the liquid material lead in the liquid path member; and a pressure applying
mechanism which starts/stops discharging the liquid material from the nozzle by selectively applying a first pressure higher than the
atmospheric pressure and a second pressure lower than the first pressure.
No. of Pages : 49 No. of Claims : 14
The Patent Office Journal 24/10/2008 26020