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_____________________________________________________________ Results and Discussion<br />

pulse assisted immobilization procedures, tailored for the specific molecule length, compact<br />

SAMs can be obtained within minutes.<br />

Figure 3.38. Coverage curves calculated from optimal capacitance curves for all three<br />

thiol derivatives: MCH 0.5/-0.2 V (10 ms pulse duration), MCU 0.5/-0.2 V (10 ms pulse<br />

duration), MCHD 0.5/-0.2 V (10 s pulse duration) according to Equation (3.9). Figure<br />

adapted from ref. 89 .<br />

It was previously reported that by applying constant potentials an acceleration of the SAM<br />

formation kinetics of aliphatic thiols (C12-C14) can be achieved 21,92 . For example, Ma and<br />

Lennox reported to obtain a complete chemisorption in only 15 min upon applying a constant<br />

potential 13 . They assessed the SAM integrity by evaluating the blocking ability towards electron<br />

transfer of a redox mediator and observed a full blocking of electron transfer for SAM formation<br />

supported by applying constant potentials from 0.2 V up to even 1 V. The obtained result is<br />

surprising since it is known that relatively high anodic potentials of above 600 mV induce Au-<br />

S bond cleavage 19 . Nevertheless, for the purpose of comparison, our potential-assisted SAM<br />

formation method was tested using this approach. A typical CV obtained by using the optimized<br />

procedure for potential-assisted SAM formation of MCU is presented in Figure 3.39, where it<br />

can be seen that a complete blocking of electron transfer is achieved already within seconds.<br />

3.3 Importance of controlling the surface 77

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