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_____________________________________________________________ Results and Discussion<br />

Figure 3.34. Capacitance kinetics curves obtained for potential-pulse assisted SAM<br />

formation of MCU using different potential pulse intensities. Pulse time was kept constant<br />

at 10 ms for all experiments. All measurements were performed in 10 mM PB, 20 mM<br />

K2SO4 (30 % ethanol) containing 1 mM MCU. Figure adapted from ref. 89 .<br />

Figure 3.35. Capacitance kinetics curves obtained for potential-pulse assisted SAM<br />

formation of MCU using the 0.3/-0.1 V pulse profile while varying the pulse time. All<br />

measurements were performed as explained in Figure 3.34. Figure adapted from ref. 89 .<br />

3.3 Importance of controlling the surface 73

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