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Chapter 4 67<br />
incorporated 5-X-ip linker: X= OH (1), H (2), NH2 (3) or Br (4). Further labeling (a, b, c<br />
etc.) refers to various levels (molar%) of DL incorporation. The PXRD patterns of the assynthesized<br />
and activated samples indicate that all materials (except 2d) are crystalline<br />
and isostructural with the parent Ru-MOF that is obtained employing the same method<br />
with H3BTC, only (Figures 4.6 and 4.7). It should be noted that Ru 2+/3+ ions can be possibly<br />
reduced to eventually yield metallic ruthenium. Therefore, the solvothermal synthesis<br />
Figure 4.7. PXRD patterns of the activated Ru-DEMOF materials 1a-1d, 2a-2d, 3a-3d, 4a-4c<br />
compared with the solvated parent Ru-MOF, respectively. 1a-1d: DL is 5-OH-ip; from 1a to 1d,<br />
feeding level is increasing: 10%, 20%, 30%, 50%, respectively. 2a-2d: DL is ip; from 2a-2d,<br />
feeding level is increasing: 10%, 20%, 30%, 50%, respectively. 3a-3d: DL is 5-NH 2 -ip, from 3a to<br />
3d, feeding level is increasing: 10%, 20%, 30%, 50%, respectively. 4a-4c: DL is 5-Br-ip, from 4a<br />
to 4c, the feeding level is increasing: 10%, 20%, 30%, respectively. Vertical lines at 42.1°and 44°<br />
stand for the respective reflections of (001) and (101) faces of hexagonal close‐packed metallic<br />
Ru-particles or Ru-NPs.<br />
conditions have to be carefully monitored. However, no PXRD-peaks in the 2θ range of 40-<br />
45° were found, neither for the as-synthesized nor for the activated samples, thus