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66 Chapter 4<br />
4.2.1.1 Crystallinity and stability of the obtained samples<br />
Figure 4.6. PXRD patterns of the solvated Ru-DEMOF materials 1a-1d, 2a-2d, 3a-3d, 4a-4c<br />
compared with the solvated parent Ru-MOF, respectively. 1a-1d: DL is 5-OH-ip; from 1a to 1d,<br />
feeding level is increasing: 10%, 20%, 30%, 50%, respectively. 2a-2d: DL is ip; from 2a-2d,<br />
feeding level is increasing: 10%, 20%, 30%, 50%, respectively. 3a-3d: DL is 5-NH 2 -ip, from 3a to<br />
3d, feeding level is increasing: 10%, 20%, 30%, 50%, respectively. 4a-4c: DL is 5-Br-ip, from 4a<br />
to 4c, the feeding level is increasing: 10%, 20%, 30%, respectively. Vertical lines at 42.1°and 44°<br />
stand for the respective reflections of (001) and (101) faces of hexagonal close‐packed metallic<br />
Ru-particles or Ru-NPs.<br />
Parent Ru-MOF in this chapter for comparison was prepared according to the synthetic<br />
method for Ru-MOF 1_ex in Chapter 3. All Ru-DEMOF samples were obtained according<br />
to the previously published procedure, [138] using [Ru2(OOCCH3)4Cl]n, H3BTC and defect<br />
generating 5-X-ipH2 as starting materials in the acetic acid/water solution under<br />
solvothermal conditions. The sample-numbering scheme is based on the framework