[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...

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[ In conventional magnetron discharges: I = k U n n = 5..10 HIPIMS exhibits n = 1! I-U Characteristic ] n plasma = 10 13 cm -3 (Ehiasarian et al, Vacuum 65 (2002) 147)
[ Plasma Composition –OES-Chromium (Ehiasarian et al, Vacuum 65 (2002) 147) HIPIMS Emission from Cr 1+ and Cr 2+ metal ions ] Cathode area = 1200 cm 2
Page 1 and 2: [ High Power Impulse Magnetron Sput
Page 3: [ 100 Hz High Power Impulse Magnetr
Page 7 and 8: [ Temporal Evolution of HIPIMS Plas
Page 9 and 10: ] [ Plasma Composition-Ion Current
Page 11 and 12: [ Ionisation of Cr in HIPIMS Cr 0 s
Page 13 and 14: [ Hauzer HTC 1000/4 ABS Batch Coate
Page 15 and 16: [ ]
Page 17 and 18: [ Interface - High Resolution-TEM (
Page 19 and 20: [ Coating Deposition (Ehiasarian et
Page 21 and 22: [ Corrosion Performance-CrN/NbN on
Page 23 and 24: [ Sliding Wear Resistance (Ehiasari
Page 25 and 26: [ Conclusions • HIPIMS has been i
Page 27: [ HIPIMS Deposition Further Reading

[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...

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