[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...
[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ... [ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...
[ Further Reading HIPIMS Plasma: • High-current low-pressure quasi-stationery discharge in a magnetic field: experimental research - Mozgrin D. V. (Moscow Eng. Phys. Inst., Russia); Fetisov I. K.; Khodachenko G. V. Source: Plasma Physics Reports, v 21, n 5, May 1995, p 400-9 • A novel pulsed magnetron sputter technique utilizing very high target power densities - Kouznetsov, V. (Dept. of Phys., Linkoping Univ., Sweden); Macak, K.; Schneider, J.M.; Helmersson, U.; Petrov, I. Source: Surface and Coatings Technology, v 122, n 2-3, 15 Dec. 1999, p 290-3 • Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge - Gudmundsson, J.T. (Sci. Inst., Iceland Univ., Reykjavik, Iceland); Alami, J.; Helmersson, U. Source: Applied Physics Letters, v 78, n 22, 28 May 2001, p 3427-9 • Influence of high power densities on the composition of pulsed magnetron plasmas - Ehiasarian, A.P. (Materials Research Institute, Sheffield Hallam University); New, R.; Munz, W.-D.; Hultman, L.; Helmersson, U.; Kouznetsov, V. Source: Vacuum, v 65, n 2, Apr 19, 2002, p 147-154 • The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge - Bohlmark, J. (IFM Material Physics, Linkoping University); Lattemann, M.; Gudmundsson, J.T.; Ehiasarian, A.P.; Aranda Gonzalvo, Y.; Brenning, N.; Helmersson, U. Source: Thin Solid Films, v 515, n 4, Dec 5, 2006, p 1522-1526 • Ionized physical vapor deposition (IPVD): A review of technology and applications - Helmersson, U. (IFM Mater. Sci., Linkoping Univ., Sweden); Lattemann, M.; Bohlmark, J.; Ehiasarian, A.P.; Gudmundsson, J.T. Source: Thin Solid Films, v 513, n 1-2, 14 Aug. 2006, p 1-24 ]
[ HIPIMS Deposition Further Reading • High power pulsed magnetron sputtered CrNx films - Ehiasarian, A.P. (Mater. Res. Inst., Sheffield- Hallam Univ., Sheffield, UK); Munz, W.-D.; Hultman, L.; Helmersson, U.; Petrov, I. Source: Surface & Coatings Technology, v 163-164, 30 Jan. 2003, p 267-72 • On the deposition rate in a high power pulsed magnetron sputtering discharge - Alami, J. (Inst. of Phys., RWTH Aachen Univ., Germany); Sarakinos, K.; Mark, G.; Wuttig, M. Source: Applied Physics Letters, v 89, n 15, 9 Oct. 2006, p 154104-1-3 HIPIMS Interface Engineering • CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique - Hovsepian, P.Eh. (Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University); Reinhard, C.; Ehiasarian, A.P. Source: Surface and Coatings Technology, v 201, n 7 SPEC. ISS., Dec 20, 2006, p 4105-4110 • CrN/NbN superlattice structured coatings with enhanced corrosion resistance achieved by high power impulse magnetron sputtering interface pre-treatment - Reinhard, C. (Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University); Ehiasarian, A.P.; Hovsepian, P.Eh. Source: Thin Solid Films, v 515, n 7-8, Feb 26, 2007, p 3685-3692 • Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion - A. P. Ehiasarian, J. G. Wen, and I. Petrov, J. Appl. Phys. 101, 054301 (2007) ]
- Page 1 and 2: [ High Power Impulse Magnetron Sput
- Page 3 and 4: [ 100 Hz High Power Impulse Magnetr
- Page 5 and 6: [ Plasma Composition -OES-Chromium
- Page 7 and 8: [ Temporal Evolution of HIPIMS Plas
- Page 9 and 10: ] [ Plasma Composition-Ion Current
- Page 11 and 12: [ Ionisation of Cr in HIPIMS Cr 0 s
- Page 13 and 14: [ Hauzer HTC 1000/4 ABS Batch Coate
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- Page 17 and 18: [ Interface - High Resolution-TEM (
- Page 19 and 20: [ Coating Deposition (Ehiasarian et
- Page 21 and 22: [ Corrosion Performance-CrN/NbN on
- Page 23 and 24: [ Sliding Wear Resistance (Ehiasari
- Page 25: [ Conclusions • HIPIMS has been i
[<br />
<strong>HIPIMS</strong> Deposition<br />
Further Reading<br />
• <strong>High</strong> power pulsed magnetron sputtered CrNx films - Ehiasarian, A.P. (Mater. Res. Inst., Sheffield-<br />
Hallam Univ., Sheffield, UK); Munz, W.-D.; Hultman, L.; Helmersson, U.; Petrov, I. Source: Surface &<br />
Coatings Technology, v 163-164, 30 Jan. 2003, p 267-72<br />
• On the deposition rate in a high power pulsed magnetron sputtering discharge - Alami, J. (Inst.<br />
of Phys., RWTH Aachen Univ., Germany); Sarakinos, K.; Mark, G.; Wuttig, M. Source: Applied Physics<br />
Letters, v 89, n 15, 9 Oct. 2006, p 154104-1-3<br />
<strong>HIPIMS</strong> Interface Engineering<br />
• CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron<br />
sputtering/unbalanced magnetron sputtering technique - Hovsepian, P.Eh. (Nanotechnology<br />
Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University);<br />
Reinhard, C.; Ehiasarian, A.P. Source: Surface and Coatings Technology, v 201, n 7 SPEC. ISS., Dec 20,<br />
2006, p 4105-4110<br />
• CrN/NbN superlattice structured coatings with enhanced corrosion resistance achieved by<br />
high power impulse magnetron sputtering interface pre-treatment - Reinhard, C.<br />
(Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam<br />
University); Ehiasarian, A.P.; Hovsepian, P.Eh. Source: Thin Solid Films, v 515, n 7-8, Feb 26, 2007, p<br />
3685-3692<br />
• Interface microstructure engineering by high power impulse magnetron sputtering for the<br />
enhancement of adhesion - A. P. Ehiasarian, J. G. Wen, and I. Petrov, J. Appl. Phys. 101, 054301<br />
(2007)<br />
]
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