[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...

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Conclusions
• HIPIMS has been implemented successfully on industrial scale
machines (cathode area >1200 cm2) with the help of an industrial size
power supply
• HIPIMS discharges produce metal ions charged up to 2+ for Ti, Cr and
Nb
• The metal ion-to-neutral ratio increases continuously as a function of
peak power
• Metal ion etching by HIPIMS promotes local epitaxial growth and
improves the adhesion of coatings without incorporation of droplets
• HIPIMS pre-treatment improves the corrosion performance due to
defect-free interface of CrN/NbN nanoscale multilayer films produced in
industrial scale machine
]