[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...
[ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ... [ High Power Impulse Magnetron Sputtering (HIPIMS) – A New Tool ...
[ Motivation • Goal: Improvement of adhesion of PVD coatings • Objectives: – Local epitaxial growth – METAL ION SOURCE ● efficient removal of surface oxides -> CLEAN INTERFACE ● metal incorporation -> “DIFFUSION” BONDING – Avoid droplets -> DEFECT-FREE COATINGS – Avoid incorporation of Argon -> HIGH TOUGHNESS INTERFACE ]
[ 100 Hz High Power Impulse Magnetron Sputtering 200 Wcm -2 n pl = 10 13 cm -3 ] active arc suppression Target area > 400 cm 2
- Page 1: [ High Power Impulse Magnetron Sput
- Page 5 and 6: [ Plasma Composition -OES-Chromium
- Page 7 and 8: [ Temporal Evolution of HIPIMS Plas
- Page 9 and 10: ] [ Plasma Composition-Ion Current
- Page 11 and 12: [ Ionisation of Cr in HIPIMS Cr 0 s
- Page 13 and 14: [ Hauzer HTC 1000/4 ABS Batch Coate
- Page 15 and 16: [ ]
- Page 17 and 18: [ Interface - High Resolution-TEM (
- Page 19 and 20: [ Coating Deposition (Ehiasarian et
- Page 21 and 22: [ Corrosion Performance-CrN/NbN on
- Page 23 and 24: [ Sliding Wear Resistance (Ehiasari
- Page 25 and 26: [ Conclusions • HIPIMS has been i
- Page 27: [ HIPIMS Deposition Further Reading
[<br />
Motivation<br />
• Goal: Improvement of adhesion of PVD coatings<br />
• Objectives:<br />
<strong>–</strong> Local epitaxial growth <strong>–</strong> METAL ION SOURCE<br />
● efficient removal of surface oxides -> CLEAN<br />
INTERFACE<br />
● metal incorporation -> “DIFFUSION” BONDING<br />
<strong>–</strong> Avoid droplets -> DEFECT-FREE COATINGS<br />
<strong>–</strong> Avoid incorporation of Argon -> HIGH TOUGHNESS INTERFACE<br />
]
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