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Deliverables and Services - IHP Microelectronics

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(83) Optimum Activation <strong>and</strong> diffusion with a<br />

Combination of Spike <strong>and</strong> Flash Annealing<br />

S. paul, W. lerch, S. McCoy, J. Gelpey, <strong>and</strong><br />

D. Bolze<br />

International Workshop on InSIGHt in Semiconductor<br />

Device Fabrication, Metrology, <strong>and</strong><br />

Modeling (InSIGHt-2007), embassy Suites,<br />

napa, May 06-09, 2007, uSA<br />

(84) An Efficient Polynomial Multiplier in<br />

GF(2m) <strong>and</strong> its Application to ECC designs<br />

S. peter, p. langendörfer<br />

Design Automation & test in europe 2007<br />

(Date 07), nice, April 16-20, 2007, France<br />

(85) Flexible Hardware Reduction for Elliptic<br />

Curve Cryptography in GF (2m)<br />

S. peter, p. langendörfer, K. piotrowski<br />

Design Automation & test in europe 2007<br />

(Date 07), nice, April 16-20, 2007, France<br />

(86) On Concealed data Aggregation for<br />

wireless Sensor Networks<br />

S. peter, p. langendörfer, K. piotrowski<br />

Ieee Consumer Communications <strong>and</strong> networking<br />

Conference (CCnC 2007), las Vegas,<br />

January 11-13, 2007, uSA<br />

(87) A Synchronization Scheme for OFdM-based<br />

60 GHz wPANs<br />

M. piz, e. Grass<br />

pIMRC 2007, Athens, September 03-07, 2007,<br />

Greece<br />

(88) Characterization of Silicon Nanostructures<br />

by Electrostatic Force Microscopy<br />

M. Ratzke, M. Birkholz, J. Bauer, D. Bolze,<br />

J. Reif<br />

e-MRS Spring Meeting, Strasbourg,<br />

May 28 - June 01, 2007, France<br />

V O R T R ä G E – P R E S E N T A T I O N S<br />

(89) Elektrische Charakterisierung von<br />

Halbleiterstrukturen mittels Electrostatic<br />

Force Microscopy<br />

M. Ratzke, M. Birkholz, J. Bauer, D. Bolze,<br />

J. Reif<br />

DpG Spring Meeting, Regensburg, March 26-<br />

30, 2007, Germany<br />

(90) Self-Organized Pattern Formation on<br />

Silicon Surfaces<br />

M. Reiche, M. Kittler, t. Wilhelm, W. Seifert,<br />

t. Arguirov, Y. Yu, o.F. Vyvenko, t. Mchedlidze<br />

2 nd Ieee International Conference on nano<br />

/ Micro engineered <strong>and</strong> Molecular Systems<br />

(neMS 2007), 16-19 January 2007, Bangkok,<br />

thail<strong>and</strong><br />

(91) Etch Stop Phenomena in deep Trench Silicon<br />

Plasma Etching for Sub 100 nm Technologies<br />

H.H. Richter, S. Günter, G. Weidner,<br />

S. Marschmeyer, H. Silz, I. Costina, K. Schulz,<br />

S. Berger<br />

DpG Frühjahrstagung, Düsseldorf,<br />

March 19-23, 2007, Germany<br />

(92) SiGe BiCMOS Technology with 3.0 ps Gate<br />

delay<br />

H. Rücker, B. Heinemann, R. Barth, J. Bauer,<br />

K. Blum, D. Bolze, J. Drews, A. Fox,<br />

o. Fursenko, t. Grabolla, u. Haak,<br />

W. Höppner, D. Knoll, K. Köpke, B. Kuck,<br />

A. Mai, S. Marschmeyer, t. Morgenstern,<br />

H.H. Richter, p. Schley, D. Schmidt, K. Schulz,<br />

B. tillack, G. Weidner, W. Winkler, D. Wolansky,<br />

H.-e. Wulf, Y. Yamamoto<br />

IeDM 2007, Washington, December 10-12,<br />

2007, uSA<br />

(93) 0.13µm SiGe:C BiCMOS development<br />

H.Rücker<br />

6 th Workshop High-performance SiGe BiCMoS<br />

for Wireless <strong>and</strong> Broadb<strong>and</strong> Communication,<br />

Frankfurt (oder), September 10, 2007,<br />

Germany<br />

A n n u A l R e p o R t 2 0 0 7

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