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Magnetic Oxide Heterostructures: EuO on Cubic Oxides ... - JuSER
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94 5. Results II: EuO integration directly on silicon<br />
Proceeding with the most complex photoemission final state structure among the Eu corelevels,<br />
we present the Eu 4d core-levels in Fig. 5.5c and d. Their complex multiplet structure<br />
is distributed in a wide energy range from 125–170 eV and we focus on the most prominent<br />
double peak structure at lower binding energy. Due to the strong 4d–4f exchange<br />
interaction and much weaker 4d spin–orbit splitting, these two 4d peak shapes cannot be<br />
assigned 4d 3/2 and 4d 5/2 spin–orbit components. By assuming a J = L − S multiplet splitting<br />
caused by the 4d–4f interaction, the two peaks are denoted as 7 D J and 9 D J multiplets, respectively.<br />
112,114,115 The fine structure of the 7 D final state is not resolved, whereas the J = 2–6<br />
components in the 9 D state are easily identified. In agreement with the other Eu core-levels,<br />
we clearly observe a mainly divalent Eu 2+ valency in EuO (i), but significant spectral contributions<br />
from Eu 3+ cations in oxygen-rich EuO (ii).<br />
Finally, we performed a quantitative peak analysis by least-squares fitting of the spectral<br />
contributions with convoluted Gaussian-Lorentzian curves. The best fit is shown by the solid<br />
lines in Fig. 5.5a–d and matches the experimental spectra quite well. From the integrated<br />
spectral intensities of the divalent Eu 2+ and trivalent Eu 3+ components, we derive a relative<br />
fraction of Eu 3+ cations of only 2.8% for stoichiometric EuO (i) and of 59% for oxygen-rich<br />
Eu 1 O 1+x (ii), both in excellent agreement with the Eu 4s and 3d analysis, as summarized in<br />
Tab. 5.2. Again, the larger ratio of Eu 3+ from the Eu 4f spectra is explained by the summation<br />
of Al and Si valence band spectral weight to the trivalent Eu peaks (as illustrated in Fig. 5.4<br />
on p. 90).<br />
Table 5.2.: Binding energies E B and Eu 3+ valency ratios r Eu3+ for (i) stoichiometric EuO and (ii) oxygenrich<br />
Eu 1 O 1+x , as obtained by least-squares fitting the Eu 4s and 4d spectra.<br />
(<br />
Eu 4s E B Eu 2+ ) (<br />
E B Eu 3+ ) r4f<br />
Eu3+<br />
4s spins ‖ 4f 4f Estates<br />
spin ‖ 4f 4f Estates<br />
spin<br />
(i) EuO 355.4 eV 362.7 eV 7.3 eV 363.5 eV 370.7 eV 7.2 eV 2.2%<br />
(ii) EuO 1+x 355.4 eV 362.6 eV 7.2 eV 363.5 eV 370.7 eV 7.2 eV 53.0%<br />
⇆<br />
(<br />
Eu 4d E B Eu 2+ ) (<br />
E B Eu 3+ ) r3d<br />
Eu3+<br />
S+1 D J 7 D J 9 D 6 Estates<br />
spin 7 D J 9 D 6 Estates<br />
spin 7 D J + 9 D 6<br />
(i) EuO 134.2 eV 128.0 eV 6.2 eV 141.9 eV 135.4 eV 6.5 eV 2.8%<br />
(ii) EuO 1+x 134.3 eV 128.0 eV 6.3 eV 141.9 eV 135.4 eV 6.5 eV 59.0%<br />
⇆<br />
HAXPES: Impact of the EuO phases on the EuO/Si interface chemical state, observed<br />
by Si 2p photoemission<br />
Having confirmed the stoichiometric quality of the EuO film on top of Si, we now proceed to<br />
study the chemical state of the interface formed between the EuO layer and the Si substrate,<br />
which is crucial for any electrical and spin transport. Here, we probe the local chemistry<br />
and bonding at the EuO/silicon transport interface by HAXPES. Photoemission from the<br />
Si 2p core-level was recorded in normal (0 ◦ ) and off-normal (45 ◦ ) emission geometry with<br />
hard X-ray (hν = 4.2 keV) excitation. In this way, the information depth of the escaping<br />
photoelectrons is substantially varied between ∼18.4 nm and ∼13.2 nm, respectively, which<br />
allows to distinguish bulk and interface-like electronic states of the buried Si substrate.<br />
In oxygen-rich EuO/HF-Si (ii), next to the well-resolved Si 0 2p peak, a broader feature can