Langmuir probe study of the plasma parameters in the HiPIMS ...

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High Power Impulse Magnetron Sputtering (HiPIMS)The high power pulsed discharge operates with aCathode voltage in the range of 500 – 2000 VCurrent densities of 3 – 4 A/cm 2Power densities in the range of 1 – 3 kW/cm 2Average power 200 – 600 WFrequency in the range of 50 – 1000 HzDuty cycle in the range of 0.5 – 5 %
HiPIMS - Electron density - summary(After Gudmundsson et al. (2002))The electron density versus time from the initiation of thepulse 9 cm below the targetThe pulse is 100 µs long and the average power 300 Wand the target made of tantalumA strong initial peak appearsA second peak appears later in time at higher pressure
Page 1 and 2: Langmuir probe study of the plasmap
Page 3 and 4: Planar dc Magnetron Sputtering Disc
Page 5: High Power Impulse Magnetron Sputte
Page 9 and 10: HiPIMS - ExperimentThe goal of this
Page 11 and 12: Plasma parameters - Langmuir probeA
Page 13 and 14: HiPIMS - Electron density10 19 axia
Page 15 and 16: HiPIMS - Plasma potentialV pl[V]654
Page 17 and 18: HiPIMS - Electron energyThe measure
Page 19 and 20: HiPIMS - Electron energyDuring the
Page 21 and 22: AcknowlegdementsCan be downloaded a

Langmuir probe study of the plasma parameters in the HiPIMS ...

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