Langmuir probe study of the plasma parameters in the HiPIMS ...
Langmuir probe study of the plasma parameters in the HiPIMS ... Langmuir probe study of the plasma parameters in the HiPIMS ...
Planar dc Magnetron Sputtering Discharge10 19n e[m −3 ]T e[eV]10 1810 173 mTorr5 mTorr10 mTorr15 mTorr10 160 20 40 60 80 100 120 140z [mm]6543210 123 mTorr0T eh 5 mTorr510 mTorr15 mTorr1015Electron energy [eV]0T ecEEPF [eV (−3/2) /m 3 ]10 18 60402010 1610 1480120100z [mm]100 20 40 60 80 100 120 140z [mm](From Sigurjonsson and Gudmundsson (2008))The electron energy distribution is bi-Maxwellian
High Power Impulse Magnetron Sputtering (HiPIMS)In a conventional dc magnetron dischargethe power density is limited by thethermal load on the targetIn a HiPIMS discharge a high powerpulse is supplied for a short periodlow frequencylow duty cyclelow average powerThe high power pulsed magnetronsputtering discharge uses the samesputtering apparatus except the powersupply
- Page 1 and 2: Langmuir probe study of the plasmap
- Page 3: Planar dc Magnetron Sputtering Disc
- Page 7 and 8: HiPIMS - Electron density - summary
- Page 9 and 10: HiPIMS - ExperimentThe goal of this
- Page 11 and 12: Plasma parameters - Langmuir probeA
- Page 13 and 14: HiPIMS - Electron density10 19 axia
- Page 15 and 16: HiPIMS - Plasma potentialV pl[V]654
- Page 17 and 18: HiPIMS - Electron energyThe measure
- Page 19 and 20: HiPIMS - Electron energyDuring the
- Page 21 and 22: AcknowlegdementsCan be downloaded a
High Power Impulse Magnetron Sputter<strong>in</strong>g (<strong>HiPIMS</strong>)In a conventional dc magnetron discharge<strong>the</strong> power density is limited by <strong>the</strong><strong>the</strong>rmal load on <strong>the</strong> targetIn a <strong>HiPIMS</strong> discharge a high powerpulse is supplied for a short periodlow frequencylow duty cyclelow average powerThe high power pulsed magnetronsputter<strong>in</strong>g discharge uses <strong>the</strong> samesputter<strong>in</strong>g apparatus except <strong>the</strong> powersupply
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