Langmuir probe study of the plasma parameters in the HiPIMS ...

Langmuir probe study of the plasma parameters in the HiPIMS ... Langmuir probe study of the plasma parameters in the HiPIMS ...

raunvis.hi.is
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13.07.2015 Views

Outlinedc Magnetron Sputtering DischargeElectron densityElectron energy distributionHigh power impulse magnetronsputtering discharge (HiPIMS)Summary of earlier workExperimental apparatus and setupPlasma parameters in the HiPIMSdischargeElectron densityElectron energy distributionPlasma potentialSummary

Planar dc Magnetron Sputtering DischargeFor a typical dc planar magnetron dischargepressure of 1 – 10 mTorra magnetic field strength of 0.01 – 0.05 Tcathode potentials 300 – 700 Velectron density in the substrate vicinity is 10 15 − 10 17 m −3low fraction of the sputtered material is ionized ∼ 1 %the majority of ions are the ions of the inert gasthe sputtered vapor is mainly neutral

Planar dc Magnetron Sputter<strong>in</strong>g DischargeFor a typical dc planar magnetron dischargepressure <strong>of</strong> 1 – 10 mTorra magnetic field strength <strong>of</strong> 0.01 – 0.05 Tcathode potentials 300 – 700 Velectron density <strong>in</strong> <strong>the</strong> substrate vic<strong>in</strong>ity is 10 15 − 10 17 m −3low fraction <strong>of</strong> <strong>the</strong> sputtered material is ionized ∼ 1 %<strong>the</strong> majority <strong>of</strong> ions are <strong>the</strong> ions <strong>of</strong> <strong>the</strong> <strong>in</strong>ert gas<strong>the</strong> sputtered vapor is ma<strong>in</strong>ly neutral

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