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Study of radiation damage in silicon detectors for high ... - F9

Study of radiation damage in silicon detectors for high ... - F9

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4. Time Development <strong>of</strong>Defects 63Figure 4.3: First order (red l<strong>in</strong>e) and second order (black l<strong>in</strong>e) ts <strong>for</strong> diodes B3, D3, G3 andG2. N eff = eq versus heat<strong>in</strong>g time at 60 C is displayed.represents the quantity used <strong>in</strong> the study <strong>of</strong> reverse anneal<strong>in</strong>g, partial bias aects values<strong>of</strong> the reverse anneal<strong>in</strong>g parameters.4.2.2 Initial Slope FitDur<strong>in</strong>g the <strong>in</strong>itial stage <strong>of</strong> reverse anneal<strong>in</strong>g, i.e. <strong>for</strong> k Y 1t 1andg Y eq k Y 2t 1 <strong>for</strong> rstand second order processes respectively, equations 4.6 and 4.7 can be l<strong>in</strong>earised t<strong>of</strong>or the rst order andN eff (t) eq= g C + g Y k Y 1t (4.8)N eff (t) eq= g C + g 2 Y eq k Y 2t (4.9)

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