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Study of radiation damage in silicon detectors for high ... - F9

Study of radiation damage in silicon detectors for high ... - F9

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8ConclusionsA systematic study <strong>of</strong> <strong>radiation</strong> <strong>damage</strong> <strong>in</strong> <strong>silicon</strong> bulk was per<strong>for</strong>med under controlledconditions. Two ir<strong>radiation</strong> sites at the TRIGA reactor near Ljubljana were equippedto provide mount<strong>in</strong>g, cool<strong>in</strong>g, bias<strong>in</strong>g and measurements <strong>of</strong> samples dur<strong>in</strong>g neutron ir<strong>radiation</strong>s.They were used to irradiate a number <strong>of</strong> <strong>high</strong> resistivity ( = 3 ; 30 kcm)p + -n-n + diodes used <strong>in</strong> this work. Ir<strong>radiation</strong> ux, sample temperature and bias voltagewere carefully controlled dur<strong>in</strong>g ir<strong>radiation</strong>s to obta<strong>in</strong> good control over ir<strong>radiation</strong>conditions.The resented results were obta<strong>in</strong>ed from more than two years <strong>of</strong> measurements<strong>of</strong> bulk properties <strong>of</strong> irradiated samples. Full depletion voltage and reverse current weremeasured <strong>in</strong> regular <strong>in</strong>tervals both dur<strong>in</strong>g and after ir<strong>radiation</strong>. To follow defect anneal<strong>in</strong>gand reverse anneal<strong>in</strong>g under well dened conditions, storage temperature and bias voltagewere controlled dur<strong>in</strong>g ir<strong>radiation</strong> and storage.In the scope <strong>of</strong> this work, the rst systematic study <strong>of</strong> the dependence <strong>of</strong> the <strong>radiation</strong><strong>in</strong>duced bulk <strong>damage</strong> <strong>in</strong> <strong>silicon</strong> on the neutron ux has been per<strong>for</strong>med. Fastanneal<strong>in</strong>g <strong>of</strong> N eff and reverse current were studied at temperatures from 0 to 15 C. Afterwards,most samples were heated to 60 C to accelerate time development. Long termanneal<strong>in</strong>g <strong>of</strong> reverse current and reverse anneal<strong>in</strong>g <strong>of</strong> N eff were studied and k<strong>in</strong>ematics<strong>of</strong> the responsible processes was searched <strong>for</strong>. F<strong>in</strong>ally, the eect <strong>of</strong> the bias voltage ondefect development was discovered [55] and rst results <strong>of</strong> its study are presented.Fast anneal<strong>in</strong>g <strong>of</strong> N eff and reverse current A signicant anneal<strong>in</strong>g <strong>of</strong> both N effand reverse current on a day scale even at 0 C was observed [56]. Though it bears nogreat importance <strong>for</strong> LHC experiments, it should be taken <strong>in</strong>to account when results fromdierent groups are compared.109

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