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INTRODUCTIONAluminum:Polycrystalline structure0.5 µm100 nm* Y-S Kang et al, J. Electron. Mater. 26, 805 (1997)* S.P. Murarka, “Metallization”, Butterworth-Heinemann, 1993Microstructure of the deposited films during deposition and annealing:Grain sizes, surface textureIt depends on: temperature, deposition rate, substrate conditions