TEOS thin film deposition - Nectec

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KEY OF THIN FILM GROWTH FOR MICROELECTRONICSBasic Fabrication processconsist of three majorsteps:1. Deposition of thinfilms2. Photolithography3. Selective etching ofthe films.
THIN FILM DEPOSITION FOR BASIC ETCH PROCESSTHIN FILM DEPOSITION FOR FABRICATION PROCESS
Page 1: Characterization of LPCVD TEOS Thin
Page 5 and 6: Outline• Thin film technology•
Page 7 and 8: Type of Deposition MethodsPhysical
Page 9 and 10: Low Pressure CVD (LPCVD)Advantage-
Page 11 and 12: SVG LPCVD furnace THERMCO TMX2603at
Page 15 and 16: Oxide (SiO2) Films Deposition- Sila
Page 17 and 18: ~0.5cm ~1cmUniformity (%) = [Standa
Page 20: Process C: C Wafer spacingTechnique
Page 23 and 24: Map TEOS filmELLIPSOMETERThin Film
Page 25 and 26: Properties of TEOS Films by LPCVDPr
Page 29 and 30: AcknowledgementsI would like to giv

TEOS thin film deposition - Nectec

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