TEOS thin film deposition - Nectec

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<strong>TEOS</strong> Films by LPCVDAdvantage- Isolation layer- Step coverage- Hard mask- Moderate <strong>deposition</strong> rateDisadvantage- Bad thickness uniformity (~3% 3%)
~0.5cm ~1cmUniformity (%) = [Standard deviation/ Thickness average] × 100
Page 1 and 2: Characterization of LPCVD TEOS Thin
Page 3 and 4: THIN FILM DEPOSITION FOR BASIC ETCH
Page 5 and 6: Outline• Thin film technology•
Page 7 and 8: Type of Deposition MethodsPhysical
Page 9 and 10: Low Pressure CVD (LPCVD)Advantage-
Page 11 and 12: SVG LPCVD furnace THERMCO TMX2603at
Page 15: Oxide (SiO2) Films Deposition- Sila
Page 20: Process C: C Wafer spacingTechnique
Page 23 and 24: Map TEOS filmELLIPSOMETERThin Film
Page 25 and 26: Properties of TEOS Films by LPCVDPr
Page 29 and 30: AcknowledgementsI would like to giv

TEOS thin film deposition - Nectec

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