Chapter 4: Activated Sludge Modelling - IqTMA-UVa
Chapter 4: Activated Sludge Modelling - IqTMA-UVa Chapter 4: Activated Sludge Modelling - IqTMA-UVa
Solving the Exponential ModelBy solving dX/dt = µX :X t = X 0 exp(µ(t - t 0 ))Or ln(X t /X 0 ) = µ(t - t 0 )Doubling time t ½ at which X = 2X 0 ?t ½ = ln2/µ4
The Monod kinetic model = m S/(K s + S)r g = X = [ m S/(K s + S)]Xµ m = maximum specific growth rate (d -1 )K s = saturation or Monod constant (g l -1 )maxmax/2S = limiting substrate (g l -1 )r su = -r g /Y = X/Y = max SX/(Y(K s +S))KsSubstrate concentrationThe cell growth rate (and therefore the substrate removal rate) increaseswith the substrate concentration, up to a certain level when it stabilize at m . If the limiting substrate concentration is low: conditions of slow growth!5
- Page 6 and 7: Endogenous decayIf part of the biom
- Page 8 and 9: Continuous Treatment in wellmixed r
- Page 10 and 11: ExerciseThe growth of a strain of L
- Page 12 and 13: Maximum Dilution Rate: DmaxCell con
- Page 14 and 15: Influence of nbVSSAn amount of non
- Page 16 and 17: Influence of nbVSSFraction of activ
- Page 18 and 19: Biomass retentionCell washout is mo
- Page 20 and 21: AerationSurfaceDiffused$$$ Aeration
- Page 22 and 23: Many configuration possible!The A2/
- Page 24 and 25: OverviewApplicationCostsAdvantagesD
- Page 26 and 27: Solid Retention Time (SRT)The SRT i
- Page 28 and 29: Expression of SBiomass balance:VdX/
- Page 30 and 31: Total mixed liquor VSS (MLVSS)MLVSS
- Page 32 and 33: ..and if we have nitrification??P M
- Page 34 and 35: Processes for BOD Removal andNitrif
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- Page 40 and 41: Processes for BOD Removal andNitrif
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- Page 44 and 45: Processes for Biological NitrogenRe
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- Page 50 and 51: Processes for Biological NitrogenRe
The Monod kinetic model = m S/(K s + S)r g = X = [ m S/(K s + S)]Xµ m = maximum specific growth rate (d -1 )K s = saturation or Monod constant (g l -1 )maxmax/2S = limiting substrate (g l -1 )r su = -r g /Y = X/Y = max SX/(Y(K s +S))KsSubstrate concentrationThe cell growth rate (and therefore the substrate removal rate) increaseswith the substrate concentration, up to a certain level when it stabilize at m . If the limiting substrate concentration is low: conditions of slow growth!5
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