High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)From Gudmundsson (2008), J. Phys.: Conf. Ser. 100 082002In magnetron sputtering discharges increased ionized fluxfraction is achieved bya secondary discharge between the target and thesubstrate (rf coil or microwaves)reshaping the geometry of the cathode to get more focusedplasma (hollow cathode)increasing the power to the cathode (high power pulse)Common to all highly ionized magnetron sputteringtechniques is a very high density plasmaPlanar <strong>Magnetron</strong> <strong>Sputtering</strong> Discharge
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