High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)SummaryThe design parameters for Ionized Physical VaporDeposition (IPVD) were discussedThe high power impulse magnetron sputtering discharge(HIPIMS) has been demonstrated as an Ionized PhysicalVapor Deposition (IPVD) tool<strong>Power</strong> supplyEssentially the same sputtering apparatus except for thepower supplyElectron densityRoughly 2 orders of magnitude higher in the substratevicinity than for a conventional dc magnetron sputteringdischarge
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