High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)Application – Film ResistivityTiN as diffusion barriers incopper and aluminuminterconnects<strong>HiPIMS</strong> deposited films havesignificantly lower resistivity thandcMS deposited films on SiO 2 atall growth temperatures due toreduced grain boundaryscatteringThus, ultrathin continuous TiNfilms with superior electricalcharacteristics can be obtainedwith <strong>HiPIMS</strong> at reducedtemperaturesFrom Magnus et al. (2012) IEEE EDL accepted
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