High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)Application - Trench fillingFrom Alami et al. (2005) JVSTA 23 278dc magnetron<strong>HiPIMS</strong>dcMS grown films exhibit rough surface, pores betweengrains and inclined columnar structure, leaning toward theapertureTa films grown by <strong>HiPIMS</strong> have smooth surface, and densecrystalline structure with grains perpendicular to thesubstrate
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