High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)Application - Trench fillingTa thin films grown on Si substrates placed along a wall ofa 2 cm deep and 1 cm wide trenchconventional dc magnetron sputtering (dcMS)high power impulse magnetron sputtering (<strong>HiPIMS</strong>)Average power is the same 440 WSubstrate bias of - 50 VThey were compared by scanning electron microscope(SEM), transmission electron microscope (TEM)
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