High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Deposition rateOne explanation is that the sputteredmaterial is ionized close to the target andmany of the metallic ions will be attractedback to the target surface by the cathodepotentialA reduction in the deposition rate wouldoccur mainly for metals with a lowself-sputtering yieldThe deposition rate in the self sputteringmode is lower than when argon sputtering isdominatingHorwat and Anders (2008) JPD 41 135210
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