High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Multiply charged ionsMultiply charged metal ions are crucialfor the transition of the discharge fromargon ion sputtering to self-sputteringSingly charged metal ions cannotcreate the secondary electronsnecessary to maintain metalself-sputtering (γ SE is practically zero)The first ionization energies of manymetals are insufficient to overcome theworkfunction of the target materialAnders et al. (2007) JAP 102 113303, Anders (2008) APL 92 201501From Anders (2008) APL 92 201501
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