High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Ionization fractionDuring the initial stages of thepulse Ar + ions dominate thedischargeLater in the pulse metal ionsbuild up and become theabundant ion speciesMultiply charged ions havebeen observedSignificant fraction of the ionflux is Ti 2+Bohlmark et al. (2006) TSF 515 1522Ti 4+ ions have beenobservedAndersson et al. (2008) APL 93 071504From Bohlmark et al. (2006) 515 1522From Ehiasarian et al. (2002) Vacuum 65 147
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