High Power Impulse Magnetron Sputtering (HiPIMS)

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High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Electron energyFrom Gudmundsson et al. (2009) JAP 105 123302The measured EEPF is Maxwellian-like during the pulse at3 (dashed) and 20 (solid) mTorr with a copper targethigh electron density leads to a Maxwellian-like low energypart of the EEPFthe depletion in the high energy part is due to the escape ofhigh energy electrons to the chamber walls and inelasticcollisions of high energy electrons
High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Electron energyFrom Gudmundsson et al. (2009) JAP 105 123302Temporal variation of the effective electron temperature100 mm below the target under the race-track (r = 40 mm)The electron energy decreases with increased dischargepressure
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High Power Impulse Magnetron Sputtering (HiPIMS)

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