High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Electron energyFrom Gudmundsson et al. (2009) JAP 105 123302The measured EEPF is Maxwellian-like during the pulse at3 (dashed) and 20 (solid) mTorr with a copper targethigh electron density leads to a Maxwellian-like low energypart of the EEPFthe depletion in the high energy part is due to the escape ofhigh energy electrons to the chamber walls and inelasticcollisions of high energy electrons
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