High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Electron density(After Bohlmark et al. (2005), IEEE Trans. Plasma Sci. 33 346)Temporal and spatial variation of the electron densityAr discharge at 20 mTorr, Ti target, pulse length 100 µsThe electron density in the substrate vicinity is of the orderof 10 18 − 10 19 m −3
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