High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Voltage - Current - timeAt high frequencies, a nitride is notable to form between pulses, andself-sputtering by Ti + -ions (singlyand multiply charged) from a Titarget is the dominant processAt low frequency, the long off-timeresult in a nitride layer being formedon the target surface andself-sputtering by Ti + - and N + -ionsfrom TiN takes placeThe observed changes in thedischarge current are reflected in theflux of ions impinging on thesubstrateFrom Magnus et al. (2011b), JAP 110 083306
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