High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Voltage - Current - timeSimilarly the current waveformin the reactive Ar/N 2 <strong>HiPIMS</strong>discharge is highly dependenton the pulse repetitionfrequency, unlike for pure ArThe current is found toincrease significantly as thefrequency is loweredThis is attributed to anincrease in the secondaryelectron emission yield duringthe self-sputtering phase,when the nitride forms on thetarget at low frequenciesFrom Magnus et al. (2011b) JAP 110 083306
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