High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
Create successful ePaper yourself
Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.
<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Voltage - Current - timeDuring reactive sputtering, areactive gas is added to theinert working gasThis changes the plasmacomposition by adding new ionspecies, and the targetcondition can also change dueto the formation of acompound on its surfaceFrom Magnus et al. (2012), JVSTA submittedThe current waveform of Ar/O 2discharge is highly dependenton the repetition frequency andapplied voltage which is linkedto oxide formation on the target
Change language