High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Voltage - Current - timeThe self-sputtering can operate in a self-sustained mode,when the ions of the sputtered vapor are created at highenough rate that the ions of the working gas are notneededThe condition for sustained self-sputtering is expressed asΠ ss = αβ t Y ss = 1whereα is the probability of ionization of the sputtered atomβ t in the probability that the newly formed ion of thesputtered vapor returns to the targetY ss is the self-sputter yield of the ionThis is a steady state situation and the current remainsconstant
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