High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS) High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Voltage - Current - timeTo describe the dischargecurrent-voltage characteristicsthe current-voltage-time spaceis requiredThe early work on HiPIMSused 50 – 100 µs pulsesThe cathode voltage and thedischarge current depend onthe discharge gas pressureI d[A]V d[kV]0.20−0.2−0.4−0.6−0.8−1250200150100500−50(a)0.4 Pa2.7 Pa0 20 40 60 80 100 120t [µS](b)0.4 Pa2.7 Pa0 20 40 60 80 100 120t [µS]From Gudmundsson et al. (2012), JVSTA 30 030801
High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Voltage - Current - timeFor longer pulses the initialpressure dependent currentpeak is followed by a secondphase that is power andmaterial dependentThe initial phase is dominatedby gas ions, whereas the laterphase has a strongcontribution fromself-sputteringFor some materials, thedischarge switches into amode of sustainedself-sputteringFrom Anders et al. (2007, 2008),JAP 102 113303 and JAP 103 039901
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - Voltage - Current - timeTo describe the dischargecurrent-voltage characteristicsthe current-voltage-time spaceis requiredThe early work on <strong>HiPIMS</strong>used 50 – 100 µs pulsesThe cathode voltage and thedischarge current depend onthe discharge gas pressureI d[A]V d[kV]0.20−0.2−0.4−0.6−0.8−1250200150100500−50(a)0.4 Pa2.7 Pa0 20 40 60 80 100 120t [µS](b)0.4 Pa2.7 Pa0 20 40 60 80 100 120t [µS]From Gudmundsson et al. (2012), JVSTA 30 030801
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