High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)Introduction<strong>Magnetron</strong> sputtering has been the workhorse of plasmabased sputtering methods for over three decadesFor many applications a high degree of ionization of thesputtered vapor is desiredcontrolled ion bombardment of the growing film – controlledby a negative bias applied to the substratecollimation – enhanced step coverageIonized flux of sputtered vapor therefore introduces anadditional control parameter into the deposition process
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