High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - <strong>Power</strong> supply<strong>HiPIMS</strong> has already beendemonstrated on an industrial scale(Ehiasarian et al., 2006) 49th SVC, p. 349Due to the absence of a secondarydischarge in the reactor an industrialreactor can be upgraded to becomeIPVD device by changing the powersupplyThis may include both rotatingmagnetron sputtering discharge andunbalanced multimagnetron sputteringsystems referred to as closed fieldunbalanced multimagnetron systems(CFUBMS)
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