High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS) High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Power supplyHigh power pulsed magnetronsputtering (HPPMS)HiPIMSa pulse of very highamplitude, an impulse, isapplied to the cathode and along pause exists betweenthe pulsesModulated pulse power (MPP)the initial stages of the pulse(few hundred µs) the powerlevel is moderate (typical fora dcMS) followed by a highpower pulse (few hundred µsup to a ms)From Gudmundsson et al. (2012), JVSTA 30 030801Power density limitsp t = 0.05 kW/cm 2 dcMS limitp t = 0.5 kW/cm 2 HiPIMS limit
High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Power supply2000−20000V T[V]−400−600−800−1000−12002502001503 mTorr5 mTorr10 mTorr15 mTorr20 mTorr0 20 40 60 80 100 120t [µS]3 mTorr5 mTorr10 mTorr15 mTorr20 mTorrCathode current (A)-20-40-60-800 50 100 150-200-400-600-800Cathode voltage (V)I T[A]100Pulse time (µs)500−500 20 40 60 80 100 120t [µS]From Magnus et al. (2011a), TSF 520 1621From Sigurjonsson et al. (2009) 52nd SVC, p. 234The exact pulse shape is determined by the loadthe discharge formedit depends on the gas type and gas pressureand the electronics of the power supply
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - <strong>Power</strong> supply2000−20000V T[V]−400−600−800−1000−12002502001503 mTorr5 mTorr10 mTorr15 mTorr20 mTorr0 20 40 60 80 100 120t [µS]3 mTorr5 mTorr10 mTorr15 mTorr20 mTorrCathode current (A)-20-40-60-800 50 100 150-200-400-600-800Cathode voltage (V)I T[A]100Pulse time (µs)500−500 20 40 60 80 100 120t [µS]From Magnus et al. (2011a), TSF 520 1621From Sigurjonsson et al. (2009) 52nd SVC, p. 234The exact pulse shape is determined by the loadthe discharge formedit depends on the gas type and gas pressureand the electronics of the power supply
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