High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS) High Power Impulse Magnetron Sputtering (HiPIMS)
High Power Impulse Magnetron Sputtering (HiPIMS)High Power Impulse Magnetron Sputtering (HiPIMS)In a conventional dc magnetron dischargethe power density is limited by thethermal load on the targetIn a HiPIMS discharge a high powerpulse is supplied for a short periodlow frequencylow duty cyclelow average powerThe high power pulsed magnetronsputtering discharge uses the samesputtering apparatus except the powersupply
High Power Impulse Magnetron Sputtering (HiPIMS)HiPIMS - Power supplyThe high power pulsed discharge operates with aCathode voltage in the range of 500 – 2000 VCurrent densities of 3 – 4 A/cm 2Power densities in the range of 0.5 – 3 kW/cm 2Average power 200 – 600 WFrequency in the range of 50 – 5000 HzDuty cycle in the range of 0.5 – 5 %
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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>HiPIMS</strong> - <strong>Power</strong> supplyThe high power pulsed discharge operates with aCathode voltage in the range of 500 – 2000 VCurrent densities of 3 – 4 A/cm 2<strong>Power</strong> densities in the range of 0.5 – 3 kW/cm 2Average power 200 – 600 WFrequency in the range of 50 – 5000 HzDuty cycle in the range of 0.5 – 5 %
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