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High Power Impulse Magnetron Sputtering (HiPIMS)

High Power Impulse Magnetron Sputtering (HiPIMS)

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<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)<strong>High</strong> <strong>Power</strong> <strong>Impulse</strong> <strong>Magnetron</strong> <strong>Sputtering</strong> (<strong>HiPIMS</strong>)In a conventional dc magnetron dischargethe power density is limited by thethermal load on the targetIn a <strong>HiPIMS</strong> discharge a high powerpulse is supplied for a short periodlow frequencylow duty cyclelow average powerThe high power pulsed magnetronsputtering discharge uses the samesputtering apparatus except the powersupply

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