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Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

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1101009080341.8A10'INDrelative intensity706050403025 6 7 8 9 1011 121314 15 16 173'201011' 2'4'020 30 40 50 60 70 80 90 100 110 120 130 140angle[degree]Fig. 3.54 the XRD result <strong>of</strong> Nb <strong>sputtering</strong> current 1.8A with annealing for 10 minutesTable 3.18 the description <strong>of</strong> the peaks <strong>of</strong> 1.8A with annealing for 10 minutes0.52940.52930.5292cubic edge length (nm)0.52910.52900.52890.52880.52870.52860.52850.52841.0 1.2 1.4 1.6 1.8current (A)on Sapphireon Nb 5 minson Nb 10 minstheoryFig.3.55 comparison <strong>of</strong> the cubic edge length between the Nb and sapphire sampleAccording to the XRD analysis <strong>of</strong> all <strong>of</strong> the samples <strong>of</strong> 10 minutes annealingexample, there are Nb and Nb 3 Sn crystal plane but not Sn crystal plane. Only the71

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