Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

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difference is changed slightly with the temperature as shown in Fig. 3.16. If the thinfilm transform to superconductor, the phase difference is changed rapidly, as shown inFig. 3.17. According to the changing of the phase difference, we can measure the T cas shown in Fig. 3.18, which is similar with that of the resistance measurementmethod.Fig. 3.18 the calculation of the TcFig. 3.19 the comparison result of resistive and inductorThe advantage of the inductor method is that it can measure the different T c ofthe same thin film. For example, in our experiment, we deposit the Nb and Sn at thesame time. If there is some zone of the film composed of pure Nb after the annealing,there will be two step of phase difference changing, where the high temperature of T cis Nb 3 Sn and the lower temperature of T c is Nb. The disadvantage is that it can not50

measure the RRR. So the resistance method can not be replaced by the inductormethod completely.We fix the frequency of the input signal as 20kHz, and the measurement result isshown in Fig. 3.19. Comparing with the result of resistance, the T c of themeasurement by inductor is higher, but the curve shape is similar.Ⅲ XRD analysisThe crystal structure measured by XRD is shown from Fig. 3.21 to Fig. 3.25. Allthe marked peaks with black number are the crystal plane of Nb 3 Sn. Comparing withthe Nb sputtering current from 1.2A to 1.6A, there are several high peak marked withred number as shown in Fig. 3.20 and Fig. 3.24. For the Nb sputtering current of 1.0A,because the abundant of Sn in the thin film, the peak of the Sn crystal plane of 731appears. The peak of 1’ and 2’ also exit in the figure from Fig. 3.21 to Fig. 3.23, butits value is small. However, the peak of 1’ and 2’ is not the crystal plane of Nb, Sn orNb 3 Sn, its meaning need the further investigation.1101009031A Nb current, lamp annealing for 3 hoursrelative intensity80706050402 1'45 678 9 10 11 12 13 14 151617 3'30201012'18020 30 40 50 60 70 80 90 100 110 120 130 140Angle[degree]Fig. 3.20 the XRD result of Run s1Table 3.3 the description of the peaks of Run s151

difference is changed slightly with the temperature as shown in Fig. 3.16. If the thinfilm transform to superconductor, the phase difference is changed rapidly, as shown inFig. 3.17. According to the changing <strong>of</strong> the phase difference, we can measure the T cas shown in Fig. 3.18, which is similar with that <strong>of</strong> the resistance measurementmethod.Fig. 3.18 the calculation <strong>of</strong> the TcFig. 3.19 the comparison result <strong>of</strong> resistive and inductorThe advantage <strong>of</strong> the inductor method is that it can measure the different T c <strong>of</strong>the same thin film. For example, in our experiment, we deposit the Nb and Sn at thesame time. If there is some zone <strong>of</strong> the film composed <strong>of</strong> pure Nb after the annealing,there will be two step <strong>of</strong> phase difference changing, where the high temperature <strong>of</strong> T cis Nb 3 Sn and the lower temperature <strong>of</strong> T c is Nb. The disadvantage is that it can not50

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