Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
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3.2.2.2 Analysis resultⅠ The thickness measurementAfter three hours annealing, we have measured the superconductor parameters <strong>of</strong>the sapphire sample. The measurement method <strong>of</strong> thickness is same with that in theChapter 2. According to the result <strong>of</strong> measurement, the thickness <strong>of</strong> each thin film isabout 1 um as shown in Table 3.2.Table 3.2 the thickness <strong>of</strong> each depositionⅡ T c measurementThe measurement method <strong>of</strong> T c and RRR is same with that in the Chapter 2.Fig. 3.12 the superconductor parameters <strong>of</strong> different sampleAccording to the result <strong>of</strong> measurement, the T c is about 17K, and the RRR isabout 5. According to the Fig. 3.12, the T c and RRR decrease at the same time whenthe ratio <strong>of</strong> the <strong>sputtering</strong> current between Nb and Sn is higher or lower than theproper value. This can be explained in the Fig. 3.4 that when the stoichiometric47