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Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film

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Fig. 2.34 the performance <strong>of</strong> the thin filmIn the Fig. 2.34, the T c <strong>of</strong> the sample deposited at the pressure <strong>of</strong> 5*10 -3 mbar arehigher that at the pressure <strong>of</strong> 3*10 -3 mbar, but the RRR <strong>of</strong> the sample deposited at thepressure <strong>of</strong> 5*10 -3 mbar are lower than that at the pressure <strong>of</strong> 3*10 -3 mbar. This meansthat the lower pressure can improve the purity <strong>of</strong> the thin film and decrease the T c .However, the reason is needed to research.2.2.3.3 XRD analysisIn order to research the crystal structure <strong>of</strong> the thin film, we should do the X raydiffraction (XRD). From the result <strong>of</strong> the XRD, we can obtain the crystal plane, andthen we can get the information <strong>of</strong> the thin film.Fig. 2.35 The XRD machine35

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