Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
Magnetron sputtering of Superconducting Multilayer Nb3Sn Thin Film
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2.2.3 Analysis and results2.2.3.1 Thickness measurementWe use the sample 4 <strong>of</strong> each run to measurement the thickness <strong>of</strong> thin film. Each<strong>of</strong> the sample is deposited the thin film on about half <strong>of</strong> the surface area. Wemeasurement the thickness <strong>of</strong> each sample five times and average the result.Fig. 2.24 the pr<strong>of</strong>ile measurement machineFig. 2.25 The measurement traceTable 2.2 The thickness measurement resultsrun Time(min) Current(A) Gas pressure (mbar) Thickness(nm) Deposition rate (nm/s)1 25 0.8 5*10 -3 1660 1.42 20 1.0 5*10 -3 2100 1.73 15 1.2 5*10 -3 1750 1.94 15 1.4 5*10 -3 2080 2.35 20 1.0 3*10 -3 1920 1.66 20 1.2 3*10 -3 2480 2.17 20 1.4 3*10 -3 2610 2.230